Buried Injector Logic, a Vertical Iil Using Deep Ion Implantation
نویسنده
چکیده
A vertically integrated alternative for integrated injection logic has been realized, named buried injector logic (BIL). 1 MeV ion implantations are used to create buried layers. The vertical pnp and npn transistors have thin base regions and exhibit a limited charge accumulation if a gate is saturated. d.c. and dynamic analysis of BIL-gate behaviour are given. A minimum gate delay of well below 1 ns is projected if collector areas are smaller than 10 pm2 within an oxide isolated structure. A relation between maximum injector current density and device size is derived. NOTATION collector area effective gain (I,,,/Zb) of a gate upward current gain of the intrinsic npn transistor downward current gain of the extrinsic pnp transistor downward current gain of the intrinsic npn transistor upward current gain of the injector pnp transistor depletion layer capacitance (F/cm2) of the npn cb-junction depletion layer capacitance (F/cm2) of the ttpn eb-junction extrinsic base area around the first collector npn-emitter area extrinsic to the total base diffusion length extrinsic base area added for each next collector fanout, i.e. number of collectors per gate current injection parameter (nfqD/Q) maximum load current supplied to a gate maximmn collector current of npn transistor part of the total injector current that is not used for switching lateral current in the intrinsic npn-base lateral current in the npn-emitter injector current density electron current density across the pnp ebjunction collector length (y-direction) electron injection currents hole injection currents effective majority concentration (majority concentration corrected for bandgap narrowing and high injection) depletion layer charge active charge sheet resistance of the npn-emitter sheet resistance of the intrinsic npn-base downward intrinsic npn ce-transittime upward intrinsic npn ce-transittime downward extrinsic pnp ce-transittime gate delay time when no active charge is present minimum gate delay (active charges present) voltages normalized on kTlq logical “hiw voltage logical “low” voltage injector voltage Vllv, TPresent address: University of Zambia, School of Engineering, Lusaka, Zambia. V,(Y) potential in the instrinsic npn-base V,(Y) potential in the npn-emitter
منابع مشابه
Electrically active defects in as-implanted, deep buried layers in p-type silicon
We have studied electrically active defects in buried layers, produced by heavy ion implantation in silicon, using both conventional deep level transient spectroscopy ~DLTS! and an isothermal spectroscopic technique called time analyzed transient spectroscopy operated in constant capacitance mode ~CC-TATS!. We show that CC-TATS is a more reliable method than DLTS for characterization of the hea...
متن کاملDesignable buried waveguides in sapphire by proton implantation
Buried and stacked planar as well as buried single and parallel channel waveguides are fabricated in sapphire by proton implantation. Good control of the implantation parameters provides excellent confinement of the guided light in each structure. Low propagation losses are obtained in fundamental-mode, buried channel waveguides without postimplantation annealing. Choice of the implantation par...
متن کاملA Hybrid Laser-driven E-beam Injector Using Photo-cathode Electron Gun and superconducting Cavity
A laser-driven photo-cathode electron gun capable of producing pulsed electron beams of 100 KeV with a duration of 35 ps was constructed as a continuing effort towards a high-brightness superconducting RF injector. Various species of photo-cathodes can be obtained either by ion implantation, CVD or ion enhanced deposition in the preparation chamber attached to the injector. A number of photo-ca...
متن کاملA Vertically Integrated Dynamic Ram-cell: Buried Bit Line Memory Cell with Floating Transfer Layer
A charge injection device has been realized in which charge can be injected on to an MOS-capacitor from a buried layer via an isolated transfer layer. The cell is positioned vertically between word and bit line. LOCOS (local oxidation) is used to isolate the cells and (deep) ion implantation to realize the buried bit line and transfer layer. This isolation prevents carriers from diffusing to ne...
متن کاملFABRICATION OF GaAs/ AlGaAs QUANTUM WELL LASERS WITH MeV OXYGEN ION IMPLANTATION*
Me V oxygen ion implantation in GaAs/ AlGaAs has been shown to provide a simple and very promising technique for quantum well laser fabrication. A lOμm stripe single quantum well (SQW) graded-index separation confinement heterostructure (GRINSCH) laser made in this way has achieved high performance with high quantum differential efficiency, low threshold current and good electrical isolation ch...
متن کامل